Organizers: Nicola Perry (Massachusetts Institute of Technology), Eric Wachsmann (University of Maryland), Krystyn Van Vliet (Massachusetts Institute of Technology), Koji Amezawa (Tohoku University).
Ho Nyung Lee
Oak Ridge National Laboratory, USA
Dr. Ho Nyung Lee is a distinguished scientist and leader of the Thin Films and Nanostructures Group in Oak Ridge National Laboratory’s Materials Science and Technology Division. His research focuses on the epitaxial design of complex oxide thin films and heterostructures. In particular, strain engineering to manipulate the flow of electrons and ions has been at the center of his research.