Chemical Vapor Deposition (CVD)
Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. In a typical CVD process, the substrate is exposed to one or more volatile precursors, which react on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. The CVD growths are very anisotropic in the direction normal to the sample, this makes CVD suitable to the production of thin and ultrathin films (e.g. graphene).
For further details clike here.
